E500

VARIAN HP is a state-of-the-art ion implanter and monitor that is used to embed desired ions into silicon semiconductor wafers. The utilizes mono- or multi-energy implanters to inject various ions into the wafer for the desired electronic properties. The multi-energy implant technology allows one to customize the implantation process using different beam settings ranging from low to high energies. This allows for a much more accurate doping control and reduces the risk of adverse effects such as over-doping or contamination.