300-mm

A end station capable of batch processing wafers, at a mechanical throughput equal to or exceeding that for 200-mm wafers in the GSD/HE system, has been developed. An evolutionary beam line has been developed, including a mass-analysis magnet, final energy magnet and resonators with increased voltage output and higher efficiency. The HE3 also incorporates the extended life source technology, designed to obtain high beam current and long source life for multiply charged ions.