10keV

Axcelis GSD/HE and VHE systems were designed to deliver exceptional productivity, lowest COO, and unmatched process flexibility. The tools provide the broadest range of ion implantation capability, from 10keV to 5MeV, to perform retrograde well, double well, triple well, channel and buried layer implants. Both systems utilize the production proven RF Linear Accelerator LINAC which delivers benchmark productivity, reliability and uptime performance.