| Part number | Brand | Description |
|---|---|---|
| 05-0127 | GASONICS | |
| 05-3606 | GASONICS | PROCESS CHAMBER,WELDMENT, IRIDIA-DL, INNER LENGTH 25CM |
| 06-2725 | GASONICS | SHOWER HEAD, TUBE 1.83 ID, SAPPHIRE,IRID |
| 11018-VHP | GASONICS | HOME SENSOR, TABLE, VHP GASONICS VHP USE ONLY |
| 12390-02 | GASONICS | Gasonics Match |
| 16384-01 | GASONICS, IPC | PCB, PWA INTERLOCK DRIVER, 16383-01 |
| 17327-01 | GASONICS | LAMPTRAY, FOR GASONICS AURA 3010 3000 |
| 17447-01 | GASONICS | LAMP CONTROLLER A3000 |
| 17447-01 | GASONICS | LAMP CONTROL MODULE A3000 |
| 2000LL | GASONICS | Gasonics Aura |
| 3750-01052 | GASONICS | PLASMA KIT 7-PARTS PRSP GASONICS |
| 95-2992 | GASONICS | Microwave |
| 95-3620 | GASONICS | |
| 95-3621 | GASONICS | |
| ESI e3511 | GASONICS | Match wafer size and production volume For 200 300 mm high-throughput lines, consider automatic single-wafer tools like TePla’s GIGAfab. For R D or legacy 3 6 in lines, downstream systems like the Gasonics Aura 1000 or ESI e3511 may suffice. |
| Gasonics L3510 ashers | GASONICS | Gasonics L3510 ashers |
| IRIDIA 4800 | GASONICS | GASONICS IRIDIA 4800 DL SN.M860220 |
| IRIDIA 4800 | GASONICS | GASONICS IRIDIA 4800 DL SN.M860680 |
| IRIDIA 4800 | GASONICS | GASONICS IRIDIA 4800 DL SN.M860070 |
| IRIDIA 4800 DL | GASONICS | GASONICS GASONICS IRIDIA 4800 DL SN M860210 |
| IRIDIA 4800 DL | GASONICS | GASONICS IRIDIA 4800 DL |
| L3500 | GASONICS | GASONICS ... |
| L3500 | GASONICS | GASONICS SN.95112 |
| L3510 | GASONICS | Gasonics 3 8 |
| L3510 | GASONICS | True downstream microwave plasma 24 in from the product compatible with Gasonics chambers 60 350 C range and lamp-assisted processing modern PC controls, Ethernet, and SECS/GEM. |
| L3510/A3010 | GASONICS | GaSonics |
| Lam 490 | GASONICS | 2000 - Leased a 6,000 sq. ft. building in Lynnwood, WA. Started refurbishment of Lam 490 590, Gasonics A1000, AMAT 8310s 8330s, and AMAT P5000 Systems. |
| PM 732, 12390-02 | GASONICS | Gasonics IPC Match |
| PX-500 | GASONICS | Downstream afterglow Plasma is generated in a separate chamber reactive radicals flow over the wafer after electrons/ions recombine, avoiding electrical damage. Examples include the Gasonics Aura 1000, March, and March PX-1000. |